Photo-Unix Series - UPE Pleated Filter Cartridge for Photoresist, Organic Solvents and Other Processes
Membrane Solutions Photo-Unix series UPE filters have a large range removal ratings from 2nm to 0.2μm. Cartridge filters ensure excellent retention capabilities, cleanliness and high chemical compatibility to meet the critical demands in SEMI-Phot processes.
The UPE membrane materials ensues cleanliness, low particle shedding and eliminates contaminants, thereby improving removal efficiency. In addition, the filter’s large membrane surface area provides high flow rate and extended service lifetime.
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Features
- High Efficiency
- Excellent Chemical Compatibility
- Good Initial Cleanliness
- Low Metal and Organic Extractables
- 100% Integrity tested
Applications
Technical Parameters
| Materials | Membrane hydrophilic UPE | |
| Support, Coreand Cage HDPE | ||
| O-ring (222) EPDM/TEV | ||
| Removal Rating | 2nm,5nm,10nm,20nm,30nm,50nm,0.1μm,0.2μm | |
| Membrane Area | SX(φ68mm) 1.2 m²/10” | |
| MX(φ81mm) 1.8 m²/10” | ||
Max.Operating Conditions |
Max.Forward Differential Pressure | 0.34 MPa(49 psi)@25℃(77 °F) |
| Max.Reverse Differential Pressure | 0.24 MPa(34 psi)@25℃(77 °F) | |
| Max.Operating Temperature | 40℃(104 °F) | |
| Package | Dry; Pre-wet by UPW | |
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