CMPro-P series cartridges consist of a pleated multi-layer gradient polypropylene membrane with a polypropylene cage. Ideal for the removal of large particles and colloids from chemical mechanical polishing (CMP) fluids, this series is particularly suited to the filtration of grinding fluids used in oxide, tungsten metal and copper metal CMP processes. It effectively removes agglomerated particles and colloidal impurities from slurry. In addition, the wide, deep fold design of the CMPro-P cartridge dramatically increases the filtration area and dirt-holding capacity, resulting in ultra-low pressure loss and long service life.